Thin Film Technology (TFT) has a world-wide reputation in the field of thin film deposition processes. This thin film deposition is an enabling technology for many large area electronics applications, such as thin-film solar, (O)LED lighting and (O)LED displays.
The mission of TFT is the development of innovative and scalable deposition technology for the production of large area applications. In this the focus is currently on the production of thin film solar cell production equipment.
TFT is an important co-founder of the Holst Centre in 2005 and the Solliance initiative (co-operation between IMEC, ECN, TUE and TNO) in 2010. Within the Solliance initiative TFT is responsible for the development of CIGS based thin film PV production concepts. For this purpose TNO has a reference R&D CIGS production line for 30x30 cm2 cells, consisting of Mo sputtering, CIGS co-evaporation, wet-chemical deposition of a buffer layer and sputtering of ZnO:Al TCO. TFT develops together with industrial partners materials, processes and the next generation production equipment for CIGS solar cells resulting in reduced Cost-of-Ownership.
The combination of the above technologies enables a unique processing approach, in which dedicated solutions in terms of cost of ownership and process efficiency can be found. The internal co-operation with Equipment for Additive Manufacturing, Responsive Materials and Coatings and Materials for Integrated Products enables us to develop industrial scale solutions, that can be transferred to new equipment for PV and Lighting for the production of reliable products on a large scale.