Current state of the art 3D lithography is performed by 2 photon polymerisation, but the resolution of this technique is still limited to 70% of the classical diffraction limit. With STED lithography the ultimate resolution depends on the parasitic exposure effect of the ‘depletion beam’ that increases when the resolution will be improved. In literature resolutions down to 1/5 of the diffraction limit have been reported.
Production of 3D photonic metamaterials that can work in the visible wavelengths, Production of 3D micro-structured scaffolds for cell growth, Production of Nanofluidic structures.
In literature a 3D resolution down to 52 × 52 × 100 nm has been reported, with a writing speed of 160 µm/s.
3D resolution of 100 × 100 × 100 nm with a writing speed of 1 mm/s.