Our work

Meta-instruments for High-throughput, High-resolution microscopy

A new instrument with a core of new optical elements such as super oscillatory lenses, metamaterial based lenses and solid immersion lenses that allows imaging beyond the diffraction limit. The miniaturised nature of the instrument allows  for parallelisation of many meta-instruments, which results in high throughput high-resolution microscopy.
Left: CAD design and layout of the META lens. / Right: First generation of realised meta-instrument.

 

COMPETITIVE ADVANTAGE

  • Non-contact (compared to AFM)
  • High resolution (in principal, down to 10 nm)
  • High throughput
  • Flexibility on the scanned location

APPLICATION AREAS

  • High-resolution imaging of wafers, mask, large substrate
  • Semiconductor metrology and inspection
  • Bio-medical high-resolution microscopy
  • Pattern as well as unpatented substrates

PROVEN SPECIFICATIONS

  • Going beyond diffraction limit (0.3)
  • Bandwidth of measurement: 10 kHz
  • Accuracy of positioning of lens: 2 nm
  • Vertical range: up to 1 mm

TARGET SPECIFICATIONS

  • Below 10 nm
  • Bandwidth increase to 100 kHz
  • >300 measurements on a wafer, results in full scanning in one minute
  • Scan size: 300 mm wafer
Contact

Dr Stefan Bäumer

  • optics
  • System architecture
  • Optical design
  • Optical Metrology
  • Micro- optics
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