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Meta-instruments for High-throughput, High-resolution microscopy
A new instrument with a core of new optical elements such as super oscillatory lenses, metamaterial based lenses and solid immersion lenses that allows imaging beyond the diffraction limit. The miniaturised nature of the instrument allows for parallelisation of many meta-instruments, which results in high throughput high-resolution microscopy.
Left: CAD design and layout of the META lens. / Right: First generation of realised meta-instrument.
Non-contact (compared to AFM)
High resolution (in principal, down to 10 nm)
Flexibility on the scanned location
High-resolution imaging of wafers, mask, large substrate
Semiconductor metrology and inspection
Bio-medical high-resolution microscopy
Pattern as well as unpatented substrates
Going beyond diffraction limit (0.3)
Bandwidth of measurement: 10 kHz
Accuracy of positioning of lens: 2 nm
Vertical range: up to 1 mm
Below 10 nm
Bandwidth increase to 100 kHz
>300 measurements on a wafer, results in full scanning in one minute