Metrology and equipment concepts
For equipment vendors, we develop new machine concepts, including for optical lithography, optical metrology and scanning probe microscopy. In such projects, we combine our understanding of the needs of the semiconductor industry with its experience in systems engineering (see also TNO’s Space Systems Engineering portfolio) and knowledge of technologies resulting from scientific developments.
One example is scanning probe microscopy, in which TNO became involved in 2014. In just a few years, TNO developed a machine concept to make this technology nearly 1000 times faster. This concept is now being brought to market by TNO’s spin-off company Nearfield Instruments (co-invested by Samsung and Innovation Industries) while we work on extended features to look, for instance, deeper into semiconductor devices. We examine nearfield optics and metamaterials for future optical metrology concepts.