TNO and Ushio, a stable partnership in advancing EUV technologies

The partnership, which spans more than a decade, focuses on the reliable operation and further advancement of EUV capabilities. A recent visit by senior management from Ushio to TNO in Delft provided an opportunity to review progress, discuss long term developments and explore future collaboration opportunities in the evolving EUV field.

A unique and deepening EUV Partnership

Since 2015, TNO and Ushio have collaborated on the establishment and continued advancement of the EBL2 facility at TNO’s high‑tech research campus in Delft. This experimental EUV facility, unique in its capability to study radiation‑induced effects on optics and reticles in a controlled vacuum environment, relies on Ushio’s high‑intensity Sn‑LDP (Laser‑assisted Discharge‑produced Plasma) EUV light source. This pulse‑based system accurately mimics lithography scanner conditions, enabling highly realistic and repeatable testing.

The long-term collaboration strengthened further in late 2023 when both organisations formalized a multi‑year agreement aimed at improving maintenance effectiveness and enhancing the reliability and predictability of the EUV light source, an important foundation for offering consistent performance to TNO’s global customers. As part of the partnership’s ongoing innovation efforts, TNO and Ushio recently successfully tested an increased source frequency, unlocking new research possibilities for EBL2 and supporting next‑generation EUV development activities.

Rob Willekers, Director of Operations at TNO High Tech Industry: ‘This long‑term partnership forms a strong foundation for continuously advancing our research capabilities. Our productive collaboration with Ushio supports our mission to serve customers and partners with world‑leading EUV expertise and drives our ambition to lead in the development of next-generation EUV sources.’

Yoshihiko Sato, Executive Officer, Leader of the EUV project, Corporate Technology Division at Ushio Inc.: ‘Ushio is honored to further strengthen the solid partnership established with TNO. Beyond the EBL2 project, our commitment to advancing the EUV market is demonstrated through ongoing innovation and improvement. We remain dedicated to enhancing the performance and reliability of our light sources and will continue to support further breakthroughs in EUV technology.’